Multiple Optical End Point Detector
Original Publication Date: 1978-Aug-01
Included in the Prior Art Database: 2005-Feb-21
The optical spectrum emitted by an excited plasma characterizes the chemical species present in the plasma. In the etching process of wafers, the contents of the plasma contain species which are a product of the etching and, hence, can furnish information on what material is being etched. This has been demonstrated in the literature [*].