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Measurement of Wafer Temperature in a Rotating Evaporation System

IP.com Disclosure Number: IPCOM000070145D
Original Publication Date: 1978-Aug-01
Included in the Prior Art Database: 2005-Feb-21

Publishing Venue

IBM

Related People

Authors:
Brainard, EJ Dahlke, GD Fredriks, RM Schick, OP [+details]

Abstract

In present E-beam evaporation systems, such as that described in [*], the temperature of a semiconductor wafer cannot be determined while it is rotating. Temperatures are measured statically with thermocouples.