Browse Prior Art Database

Triode System for Plasma Etching

IP.com Disclosure Number: IPCOM000070227D
Original Publication Date: 1978-Aug-01
Included in the Prior Art Database: 2005-Feb-21

Publishing Venue

IBM

Related People

Authors:
Chapman, BN Minkiewicz, VJ [+details]

Abstract

As shown in the drawing, the triode plasma etching system includes an evacuated chamber 4 having a target electrode 1 supporting a target 5, a ground electrode 3, and a third electrode 2 which supports the substrate 6 to be plasma etched.