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Triode System for Plasma Etching Disclosure Number: IPCOM000070227D
Original Publication Date: 1978-Aug-01
Included in the Prior Art Database: 2005-Feb-21

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Chapman, BN Minkiewicz, VJ [+details]


As shown in the drawing, the triode plasma etching system includes an evacuated chamber 4 having a target electrode 1 supporting a target 5, a ground electrode 3, and a third electrode 2 which supports the substrate 6 to be plasma etched.