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Single Level, Multi Material Bubble Domain Structures

IP.com Disclosure Number: IPCOM000070271D
Original Publication Date: 1978-Aug-01
Included in the Prior Art Database: 2005-Feb-21

Publishing Venue

IBM

Related People

Authors:
Lin, BJ Tao, LJ [+details]

Abstract

This process is used to provide coplanar structures which are comprised of different materials, and which can be produced by a single lithography process. This is especially useful for providing magnetic bubble domain structures where magnetic materials are located close to the bubble domain film in the area where bubbles are to be propagated, and where conductive layers are located close to the bubble domain film in areas where transfer gates are to be fabricated.