Browse Prior Art Database

Photoresist Evaluation Technique

IP.com Disclosure Number: IPCOM000070319D
Original Publication Date: 1978-Sep-01
Included in the Prior Art Database: 2005-Feb-21

Publishing Venue

IBM

Related People

Authors:
Davis, CF Ogden, GD [+details]

Abstract

Photopolymers in the form of photoresist are extensively used in the fabrication of printed circuitry. In order to fabricate circuitry with fine lines one must maintain tight control on the characteristics of the photoresist used. Shown above is an inexpensive tool for quickly and efficiently obtaining a figure of merit for a photoresist.