Delineation of Semiconductor Junctions
IP.com Disclosure Number:
IPCOM000074758D
Original Publication Date: 1971-Jun-01
Included in the Prior Art Database: 2005-Feb-23
Original Publication Date: 1971-Jun-01
Included in the Prior Art Database: 2005-Feb-23
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IBM
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Abstract
In this method the delineation of junctions in semiconductors using the standard bevel & stain technique is greatly improved.
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Delineation of Semiconductor Junctions
In this method the delineation of junctions in semiconductors using the standard bevel & stain technique is greatly improved.
In the identification in semiconductor devices of PN junctions it is conventional to bevel the sample and subsequently stain it with chemicals such as Cu (NO(3))(2). In this technique the sample is further heated to approximately 160 degrees F and quenched. The additional treatment not only provides a better contrast between the opposite type impurity regions, but also delineates the N+ diffused region from the N- epi layer.
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