Browse Prior Art Database

Article Transfer/Cleaning/Inspection Station

IP.com Disclosure Number: IPCOM000082850D
Original Publication Date: 1975-Feb-01
Included in the Prior Art Database: 2005-Feb-28
Document File: 2 page(s) / 41K

Publishing Venue

IBM

Related People

Authors:
Rajac, TJ [+details]

Abstract

Semiconductor wafers are processed with improved yields by reduced surface contamination, during transfer/cleaning and inspection operations. An enclosed transfer apparatus permits inspection and wafer cleaning to occur in a clean atmosphere, while wafers are transferred from one carrier to another carrier.