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Flaming the Clamp Ring at Deep Trench Etching Step to Reduce Contamination

IP.com Disclosure Number: IPCOM000117883D
Original Publication Date: 1996-Jul-01
Included in the Prior Art Database: 2005-Mar-31

Publishing Venue

IBM

Related People

Authors:
Richard, M Sabater, P [+details]

Abstract

At the deep trench dry etching step, a quartz clamp ring is usually used to maintain the resist patterned S/C wafer.