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Variable Width Aperture Ion Etching Process

IP.com Disclosure Number: IPCOM000117952D
Original Publication Date: 1996-Jul-01
Included in the Prior Art Database: 2005-Mar-31

Publishing Venue

IBM

Related People

Authors:
Bates, K Erwin, JK [+details]

Abstract

Disclosed is a method to produce variable groove depth grating waveguide couplers on planar waveguides using ion beam etching and a specially shaped aperture.