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Laser Induced Deposition of Aluminum from the Vapor Phase Disclosure Number: IPCOM000122338D
Original Publication Date: 1991-Nov-01
Included in the Prior Art Database: 2005-Apr-04
Document File: 1 page(s) / 67K

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Baum, TH Jackson, RL Larson, CE [+details]


The laser-induced deposition of high purity aluminum is achieved by the pyrolytic decomposition of the aluminum hydride-trimethylamine complex. The nonpyrophoricity and substantial vapor pressure of this aluminum precursor makes it ideal for the rapid deposition of pure aluminum metal. This is a vast improvement over other aluminum alkyl complexes which are either relatively nonvolatile (i.e., triisobutyl aluminum) or decompose to carbon contaminated aluminum films (i.e., trimethyl aluminum).