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A Method for Reducing Shot Boundary Error in Manufacturing TFT-LCD

IP.com Disclosure Number: IPCOM000123063D
Original Publication Date: 1998-May-01
Included in the Prior Art Database: 2005-Apr-04
Document File: 2 page(s) / 47K

Publishing Venue

IBM

Related People

Fujita, T: AUTHOR [+3]

Abstract

Disclosed is a method for reducing shot boundary error in manufacturing TFT-LCD (Thin Film Oxide-Liquid Crystal Display).

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 100% of the total text.

A Method for Reducing Shot Boundary Error in Manufacturing TFT-LCD

   Disclosed is a method for reducing shot boundary error in
manufacturing TFT-LCD (Thin Film Oxide-Liquid Crystal Display).

   Constructing TFT needs many inorganic patterned
layers.  This pattern accuracy usually depends on its exposure
accuracy, which play an important role to define function of
TFT-LCD.  Exposure is divided in some shot area.  Although pattern is
very accurate in one exposure shot, the pattern on the boundary
between two shot is not so accurate.  This causes the change of
electronic characteristics of TFT and brings shot boundary error at
front of screen.  This can be recognized as TFT-LCD quality problem
to be fixed.  In this method, each layers that construct TFT, is
exposed at each shot blocks which are succeed at different points
from other layers, to minimize the quick electronic TFT
characteristics change which cause the shot boundary error.  Adopting
this design method, the change of electronic characteristics of TFT
on shot boundary shall be caused not all but just one layer shot
boundary error, TFT-LCD quality problem is expected to reduce.
Figures show the example for the boundary between two shots.