Selective Deposition of Tantalum Oxynitride Films for Advanced Mask Manufacturing
Publication Date: 2005-Aug-31
The IP.com Prior Art Database
Disclosed is a method that selectively deposits tantalum oxynitride (TaOXNY) films. This decreases the number of process steps in mask manufacturing by eliminating the etch step. Benefits include a solution that simplifies the manufacturing process and increases CD linearity in the patterning step.