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Self-aligned air-gaps for trench-first metal hard-mask integration

IP.com Disclosure Number: IPCOM000234147D
Publication Date: 2014-Jan-14
Document File: 3 page(s) / 36K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for self-aligned air-gap formation for Back End of Line (BEOL) interconnects, without additional lithography steps.