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A Batch Process for Creating Vicinal Surface on Multiple SiC Wafers and Producing Single Graphene without Pitting the Surface

IP.com Disclosure Number: IPCOM000236467D
Publication Date: 2014-Apr-29

Publishing Venue

The IP.com Prior Art Database

Abstract

A batch process is disclosed for creating vicinal surface on multiple Silicon carbide (SiC) wafers and producing single graphene without pitting the surface.