Browse Prior Art Database

A method to perform power and routing efficient clock routing with auto shielding sandwiched structure Disclosure Number: IPCOM000236487D
Publication Date: 2014-Apr-29
Document File: 1 page(s) / 25K

Publishing Venue

The Prior Art Database


In this article, a methodology is proposed to efficiently route local clock spines in a sandwiched structure. With this special structure, one can save routing resource for new technology designs and save power as well because the compacted structure shortens the distance between spine and driver.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 60% of the total text.

Page 01 of 1

A method to perform power and routing efficient clock routing with auto shielding sandwiched structure

The main idea of this article is to first implement a sandwiched structure local clock routing for a given structured latch placement which 1) packs launch and capture clocks next to power stripes, and test phase local clock nets between them into one power bay, 2) lowers power consumption and efficiently uses routing space because the structure is compact, 3) shields by design the different functional clock nets to reduce noise.

The definition of sandwiched structured clock routing is that, for a given structured placement of latches (and the clock buffer that feeds them), the launch and capture and test phase clock nets are packed (sandwiched) into a single power bay (i.e., between two power or ground rails). The launch and capture local clock nets are next to power stripes, and the test phase local clock nets are wired in between the capture and launch local clock nets. If the 3 spines could not be packed into the same power bay (e.g., because of isolation spacing or dedicated shield wiring shapes, if they could not be arranged in a mutually exclusive, inherently shielded pattern as described), then wiring resource in the power bay would be wasted. This structure is very important in newer technologies where double patterning lithography is required for the thinnest, most tightly-spaced metal layers, as the assignment of wires to unique mask layers introduce...