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SADP scheme with Self-aligned cuts and self-aligned vias Disclosure Number: IPCOM000246024D
Publication Date: 2016-Apr-26
Document File: 10 page(s) / 1M

Publishing Venue

The Prior Art Database


Disclosed is a flow that enables both self-aligned cuts for self-aligned double patterning (SADP) at 40nm pitch or less and self-aligned vias