Vertically stacked bi-layer spacer
Publication Date: 2018-Aug-27
The IP.com Prior Art Database
Disclosed is a method to form a vertically stacked bi-layer spacer structure. The novel structure makes the vertically stacked bilayer spacer such that the lower part of the spacer remains, per the POR, and the low k spacer and top part of the spacer is Silicon Nitride (SiN).