Method to Improve BEOL Shorts and TDDB
Publication Date: 2018-Sep-20
The IP.com Prior Art Database
Disclosed are a structure and method to create more dielectric spacing post-damascene/dual damascene dielectric reactive ion etch (RIE) and pre-metallization by depositing a low k layer. The low k layer is patterned to leave more dielectric on the upper sidewalls of the trenches.