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New Edge Placement Error (EPE) paradigm for OPC of curved shapes Disclosure Number: IPCOM000255457D
Publication Date: 2018-Sep-27

Publishing Venue

The Prior Art Database


Disclosed is a new paradigm to calculate Edge Placement Error (EPE) and move edges in applications that need curved shapes to be active areas or gate areas in semiconductor chips. This method optimizes optical proximity correction (OPC) based on area EPE.