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Month of May 2007 - Page Number 23

Showing 221 - 230 of 403 from May 2007
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  1. 221.
    Convo Stubs are difficult to manage if there are a large number of them created. However, with some interaction with other parts of a smart device, they can be made to be smarter and become easier to use.
    IPCOM000152885D | Original Publication Date: 2007-May-16
  2. 222.
    Convo stubs shouldn't be limited to just verbal interruptions, but should also be robust enough to allow for non-verbal interruptions as well.
    IPCOM000152884D | Original Publication Date: 2007-May-16
  3. 223.
    Cosmetic and Personal Care compositions are discussed comprising heat treated xanthan gum where the heat treated xanthan gum is used either alone or in combination with other thickening or suspending agents, to suspend a particulate ingredient. The compositions may further contain a film forming polymer to extend...
    IPCOM000152883D | 2007-May-16
  4. 224.
    Services in a DVB-H system are based on IP packets, and broadcasted to all the users. When selecting a program to watch, the user tells the hardware to let some packets go through while continue to discard all unwanted ones, to prevent useless data streams. Part of this filtering is done at IP packets level. This is...
    IPCOM000152882D | 2007-May-16
  5. 225.
    A device for continuous reeling of a pulp sheet, in particular to the discharge of waste web sections from a reeling device. This machine uses a new design of pivoting secondary arm to provide clearance to allow removal of waste in cross-machine direction at the reel drum area on reeling and winding machines. The...
    IPCOM000152881D | 2007-May-16
  6. 226.
    IPCOM000152871D | Original Publication Date: 2007-May-16
  7. 227.
    Lithography patterning is a routine but expensive process used in semiconductor industry. In order to reduce the high cost of lithography patterning and to improve the capability of fabricating fine features, we explored an effective way for pattern etching of photo resist with ion beams at normal incidence through...
    IPCOM000152870D | 2007-May-15
  8. 228.
    We investigate the formation of CoSi2 over a wide temperature range (275-450C for the first of a 2-step formation), and show that, for a given anneal, it is possible to obtain significantly thicker silicides on poly than on substrate Si. By selecting appropriate time-temperature combinations, one can obtain thickness...
    IPCOM000152869D | 2007-May-15
  9. 229.
    Lithography patterning is a routine but expensive process used in semiconductor industry. In order to reduce the high cost of lithography patterning and to improve the capability of fabricating fine features, we explored an effective way for pattern etching of photo resist with ion beams at normal incidence through...
    IPCOM000152867D | 2007-May-15
  10. 230.
    Lithography patterning is a routine but expensive process used in semiconductor industry. In order to reduce the high cost of lithography patterning and to improve the capability of fabricating fine features, we explored an effective way for pattern etching of photo resist with ion beams at normal incidence through...
    IPCOM000152864D | 2007-May-15