Month of May 2015 - Page Number 5

Showing 41 - 50 of 276 from May 2015
Browse Prior Art Database
  1. 41.
    Disclosed is a method to connect charging devices, Smart Battery Systems (SBS), and micro-grids with a controller that can monitor and manage an ecosystem of batteries to use the energy of one or more batteries that needs to be discharged for optimal health to provide power to systems that are charging a battery...
    IPCOM000241731D | 2015-May-26
  2. 42.
    Disclosed is a method to generate a polymeric component having anti-counterfeiting measures, which utilizes vapochromic compounds that change color and response time based on the solvent used for identification.
    IPCOM000241730D | 2015-May-26
  3. 43.
    Disclosed is a method to visually detect power jumper cord routing in a rack or case.
    IPCOM000241729D | 2015-May-26
  4. 44.
    Disclosed is a process which incorporates a series of partial dice and wafer transport operations to allow an individual die to fully separate from a wafer while remaining protected. This protection is on a dicing tape/frame for picking at placement or is by complete removal from the dicing tape for placement...
    IPCOM000241728D | 2015-May-26
  5. 45.
    Disclosed is an inductor structure with high u Ferrite material on the top and bottom to prevent magnetic field loss and lower quality factor and improve performance at chip level. The solution includes a process for fabrication that is compatible with standard Complimentary Metal-Oxide Semiconductor (CMOS)...
    IPCOM000241727D | 2015-May-26
  6. 46.
    Disclosed is a new algorithm for correctly handling reconvergence in clock networks during Common Path Pessimism Removal (CPPR) in Statistical Static Timing Analysis (SSTA). No change is needed in the existing algorithm for Frequency Independent (FI) tests (where clock and data Arrival Times are in the same...
    IPCOM000241726D | 2015-May-26
  7. 47.
    Disclosed is a simple method to evaluate the quality of Chemical Vapor Deposition (CVD) Cobalt (Co) liner materials. The method uses a differential phase contrast imaging technique for evaluating the CVD Co liner materials applied in the Back End of Line (BEOL) integration scheme for a 10 nm node and beyond.
    IPCOM000241725D | 2015-May-26
  8. 48.
    Disclosed is a method to prevent strain relaxation during Nanobeam diffraction (NBD) sample preparation. The novel solution comprises two ways to of ensuring full fin loops are included in NBD macros, which then improves the accuracy of fin strain measurement.
    IPCOM000241724D | 2015-May-26
  9. 49.
    Disclosed is a method to evaluate the Ge concentration using lattice deformation measurement of Silicon Germanium (SiGe) Fin Field Effect Transistor (FinFET).
    IPCOM000241723D | 2015-May-26
  10. 50.
    Disclosed is a method for high temperature bonding of a thin glass plate or glass wafer to a carrier in order to implement glass interposers for high performance semiconductor packaging.
    IPCOM000241722D | 2015-May-26