Month of September 2018 - Page Number 10

Showing 91 - 100 of 388 from September 2018
Browse Prior Art Database
  1. 91.
    IPCOM000255432D | 2018-Sep-27
  2. 92.
    IPCOM000255431D | 2018-Sep-27
  3. 93.
    IPCOM000255430D | 2018-Sep-27
  4. 94.
    IPCOM000255429D | 2018-Sep-27
  5. 95.
    IPCOM000255428D | 2018-Sep-26
  6. 96.
    IPCOM000255427D | 2018-Sep-26
  7. 97.
    Disclosed is a method for air spacer depth control during the dummy poly-Si gate removal process. A block mask prior to dummy gate pull prevents shorting between the gate and source drain (S/D).
    IPCOM000255426D | 2018-Sep-26
  8. 98.
    Disclosed is a self-align Fin-cut last process. The structure is a n Al2O3 or other material liner (different from Oxide/Nit/Poly) on the Fin bottom (below revealed top).
    IPCOM000255425D | 2018-Sep-26
  9. 99.
    IPCOM000255424D | 2018-Sep-26
  10. 100.
    IPCOM000255423D | 2018-Sep-26