Month of September 2018 - Page Number 6

Showing 51 - 60 of 388 from September 2018
Browse Prior Art Database
  1. 51.
    IPCOM000255478D | 2018-Sep-27
  2. 52.
    IPCOM000255477D | 2018-Sep-27
  3. 53.
    IPCOM000255476D | 2018-Sep-27
  4. 54.
    IPCOM000255475D | 2018-Sep-27
  5. 55.
    IPCOM000255474D | 2018-Sep-27
  6. 56.
    IPCOM000255473D | 2018-Sep-27
  7. 57.
    IPCOM000255472D | 2018-Sep-27
  8. 58.
    IPCOM000255471D | 2018-Sep-27
  9. 59.
    IPCOM000255470D | 2018-Sep-27
  10. 60.
    Disclosed is a new advanced technology nodes scheme that introduces a slow anneal step at post-polysilicon (PC) dummy gate formation to eliminate voids and seams in the dummy gate fill and avoid issues in devices and yields. The anneal is a furnace anneal post dummy gate formation. The core novel idea is to deposit...
    IPCOM000255469D | 2018-Sep-27