Month of November 2018 - Page Number 9

Showing 81 - 90 of 396 from November 2018
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  1. 81.
    Disclosed is a method to use a simple integration scheme for reducing the low-k of the spacer to improve the capacitance overlay. Described herein is a mechanism to lower the k-value of the films by making it more oxygen rich and lowering the nitrogen concentration in the films.
    IPCOM000256373D | 2018-Nov-26
  2. 82.
    IPCOM000256372D | 2018-Nov-26
  3. 83.
    IPCOM000256371D | 2018-Nov-23
  4. 84.
    IPCOM000256370D | 2018-Nov-23
  5. 85.
    IPCOM000256369D | 2018-Nov-23
  6. 86.
    IPCOM000256368D | 2018-Nov-23
  7. 87.
    IPCOM000256367D | 2018-Nov-23
  8. 88.
    IPCOM000256366D | 2018-Nov-23
  9. 89.
    IPCOM000256365D | 2018-Nov-23
  10. 90.
    IPCOM000256363D | 2018-Nov-23